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Three chamber magnetron sputtering coating machine HD-SCK1600-ICP experimental platform

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Characteristics of the HD-SCK1600-ICP experimental platform:

Composed of CM1 film inlet chamber (pre-treatment chamber), CM2 process chamber (optical film forming chamber), and CM3 (AF film forming chamber); Each cavity can flexibly switch process configurations, suitable for complex process research, development, design, and production

Suitable for film making (NCVM), car mounted, camera ultra hard AR, IR-CUT and other filters, facial recognition, can be AR+AF, NCVM+AF one-time film forming.

◆ Film forming method: Ionization coating after magnetron sputtering ICP

◆ Vehicle hanging plate can be designed with special shapes, and special samples can be made

◆ Capable of producing optical films, color films, hard film layers, and AF films on glass, ceramics, PC boards, and film substrates. Experimental applications include film system design and development for coating processes such as mobile phone covers, cameras, smart homes, smart wearables, and car displays, as well as equipment software and hardware development and testing.

In the previous:Four chamber magnetron sputtering coating machine HD-SSCK1600-ICP (AR+DLC+AF) experimental platform
The next article:Dual chamber magnetron sputtering coating machine HD-CK1200-ICP experimental platform

Since its establishment, the company has been a leading enterprise in the vacuum coating equipment industry and one of the few enterprises in the industry with the ability to design and integrate coating production line equipment as a whole. It has..

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